Assembly of charged aerosols on non-conducting substrates via ion-assisted aerosol lithography (IAAL)--颗粒学报PARTICUOLOGY

Kang, S., Jung, W., Kim, D. S., Park, S. J., & Choi, M. (2017). Assembly of charged aerosols on non-conducting substrates via ion-assisted aerosol lithography (IAAL). Particuology, 33, 17-23. https://doi.org/10.1016/j.partic.2016.12.001

Assembly of charged aerosols on non-conducting substrates via ion-assisted aerosol lithography (IAAL)

Seunghyon Kang ^{a b}, Wooik Jung ^{a b}, Dae Seong Kim ^b, Sei Jin Park ^b, Mansoo Choi ^{a b *}

a School of Mechanical and Aerospace Engineering, Seoul National University, Seoul 08826, Republic of Korea
b Global Frontier Center for Multiscale Energy Systems, Seoul National University, Seoul 08826, Republic of Korea

10.1016/j.partic.2016.12.001

Volume 33, August 2017, Pages 17-23

Received 30 January 2016, Revised 8 December 2016, Accepted 15 December 2016, Available online 28 March 2017, Version of Record 13 June 2017.

E-mail: mchoi@snu.ac.kr

Highlights

• 3D nanoparticle (NP) structures were grown on non-conducting substrates via the IAAL process.

• Electric field simulation confirmed charged NP assembly terminated after charge build up.

• An ion trap and a corona discharger were used to precisely control the ion flux.

• A prolonged assembly of NP structures on non-conducting substrate was achieved by the control.

Abstract

The development of ion-assisted aerosol lithography (IAAL) has enabled fabrication of complex three-dimensional nanoparticle (NP) structures on conducting substrates. In this work, the applicability of the IAAL technique was investigated on non-conducting substrates. The NP structure growth process on a non-conducting substrate was found to self-terminate and the structures subsequently repel incoming charged NPs and scatter them away. Electric field calculations supported the experimental findings and confirmed that the electric field distortions owing to charge build-up within the structures prevented additional NP deposition thereon. To regulate the charge build-up without compromising the number of NPs available for assembly, a corona discharger and an ion trap were implemented. By varying the number of ions available in the assembly process, an optimum level of ion injection was found that allowed for a prolonged (>120 min) assembly of NP structures on non-conducting substrates without the unwanted scattering of NPs.

Graphical abstract

Keywords

Nanoparticle assembly; Non-conducting substrate; Ion-assisted aerosol lithography; Ion trap

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